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dc.contributor.authorZieliński, Marek
dc.contributor.authorMiękoś, Ewa
dc.contributor.authorSzczukocki, Dominik
dc.contributor.authorDałkowski, Radosław
dc.contributor.authorLeniart, Andrzej
dc.contributor.authorKrawczyk, Barbara
dc.contributor.authorJuszczak, Renata
dc.date.accessioned2015-09-01T07:00:07Z
dc.date.available2015-09-01T07:00:07Z
dc.date.issued2015-03-23
dc.identifier.issn1452-3981
dc.identifier.urihttp://hdl.handle.net/11089/11609
dc.description.abstractThe paper presents a study of the effect of constant magnetic field (CMF) on the basic processes of Co-W-Cu alloys electrodeposition. The alloys electrodeposited in the presence of CMF were more homogeneous and smooth than those obtained without CMF. The reason for these changes was the fact that the Lorentz force, generated in CMF, caused the magnetohydrodynamic (MHD) effect. Electrolyte motion under the influence of CMF caused an increase of cobalt and tungsten content with a simultaneous decrease of copper content in the alloy. The presence of the magnetic field during plating leads to significant greater corrosion resistance and smaller roughness.pl_PL
dc.language.isoenpl_PL
dc.publisherElectrochemical Science Grouppl_PL
dc.relation.ispartofseriesInternational Journal of Electrochemical Science;2015
dc.rightsUznanie autorstwa 3.0 Polska*
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/pl/*
dc.subjectAlloyspl_PL
dc.subjectElectrodepositionpl_PL
dc.subjectConstant magnetic fieldpl_PL
dc.subjectMagnetohydrodynamic effectpl_PL
dc.titleEffects of Constant Magnetic Field on Electrodeposition of Co-W-Cu Alloypl_PL
dc.typeArticlepl_PL
dc.page.number4146 - 4154pl_PL
dc.contributor.authorAffiliationZieliński Marek, Department of Inorganic and Analytical Chemistry, Faculty of Chemistry, University of Lodzpl_PL
dc.contributor.authorAffiliationMiękoś Ewa, Department of Inorganic and Analytical Chemistry, Faculty of Chemistry, University of Lodzpl_PL
dc.contributor.authorAffiliationSzczukocki Dominik, Department of Inorganic and Analytical Chemistry, Faculty of Chemistry, University of Lodzpl_PL
dc.contributor.authorAffiliationDałkowski Radosław, Department of Inorganic and Analytical Chemistry, Faculty of Chemistry, University of Lodzpl_PL
dc.contributor.authorAffiliationLeniart Andrzej, Department of Inorganic and Analytical Chemistry, Faculty of Chemistry, University of Lodzpl_PL
dc.contributor.authorAffiliationKrawczyk Barbara, Department of Inorganic and Analytical Chemistry, Faculty of Chemistry, University of Lodzpl_PL
dc.contributor.authorAffiliationJuszczak Renata, Department of Inorganic and Analytical Chemistry, Faculty of Chemistry, University of Lodzpl_PL
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dc.contributor.authorEmailzielmark@chemia.uni.lodz.plpl_PL
dc.contributor.authorEmailmagnet@toya.net.plpl_PL
dc.relation.volume10pl_PL


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